Optinization of one- and two-dimenasional masks in the optical lithography

Farkas, Richárd (2003) Optinization of one- and two-dimenasional masks in the optical lithography. ['eprint_fieldopt_thesis_type_master' not defined] thesis, Szegedi Tudományegyetem.

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      Item Type: Thesis (['eprint_fieldopt_thesis_type_master' not defined])
      Institution:Szegedi Tudományegyetem
      ['eprint_fieldname_faculty' not defined]:Faculty of Science and Mathematics
      Department:Számítástudományi Tanszék
      ['eprint_fieldname_specialization' not defined]:közgazdasági programozó matematikus
      Discipline:Informatics
      Supervisor(s):
      Supervisor
      Supervisor scientific name label
      Email
      EHA
      Kókai, Gabriella
      UNSPECIFIED
      UNSPECIFIED
      UNSPECIFIED
      Tollkühn, Bernd
      UNSPECIFIED
      UNSPECIFIED
      UNSPECIFIED
      Erdmann, dr. Andreas
      UNSPECIFIED
      UNSPECIFIED
      UNSPECIFIED
      Subjects:01. Natural sciences > 01.02. Computer and information sciences
      Depositing User:TTK szerkesztő
      Date Deposited:2011. Mar. 10. 15:14
      Last Modified:2013. Mar. 14. 06:59
      URI:https://diploma.bibl.u-szeged.hu/id/eprint/655

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